Plasma CVD apparatus

Details Plasma CVD apparatus Plasma CVD apparatus

1989-12-18

1991-04-30

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 315112, 31323131, H01J 724

Patent

active

050121588

ABSTRACT:
A plasma CVD apparatus having a rotary vacuum reaction vessel, a starting gas introducing port, an ambient gas introducing port, an exhaust port, electrodes or an induction coil for applying a high-frequency electric field, and a cooling pipe provided in the starting gas introducing port for cooling the starting gas introducing port, wherein the starting gas introducing port and the exhaust port are located in opposition to each other on a rotating axis of the reaction vessel.

REFERENCES:
patent: 3296410 (1967-01-01), Hedger
patent: 3340415 (1967-09-01), De Ruiter et al.
patent: 3903891 (1975-09-01), Brayshaw
patent: 4423303 (1983-12-01), Hirose et al.
patent: 4482246 (1984-11-01), Meyer et al.
patent: 4645977 (1987-02-01), Kurokawa et al.
patent: 4828369 (1989-05-01), Hotomi
patent: 4859908 (1989-08-01), Yoshida et al.
patent: 4910044 (1990-03-01), Yamazaki et al.

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