Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate
2005-05-03
2005-05-03
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Hollow work, internal surface treatment
C134S001100, C134S031000, C134S902000, C216S064000, C216S067000, C438S905000
Reexamination Certificate
active
06886573
ABSTRACT:
A process for cleaning a deposit from an interior surface of a processing chamber includes generating a plasma from a cleaning gas including SO2F2and contacting the interior surface with the plasma for a time sufficient to convert the deposit into a volatile product, thereby cleaning the deposit from the interior surface, in which the process is conducted in the absence of SF6. The deposits, which may be removed by the process of the invention, include silicone, silicone oxide, silicone nitride, tungsten, copper and aluminum.
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“Applications of Plasma Processes to VLSI Technology,” T. Sugano, John Wiley & Sons, 1980, pp. 102-215.
Hart James Joseph
Hobbs John Peter
Air Products and Chemicals Inc.
Chase Geoffrey L.
Kornakov M.
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