Plasma chemical vapor deposition process for producing a hard mu

Details Plasma chemical vapor deposition process for producing a hard mu Plasma chemical vapor deposition process for producing a hard mu

1992-03-31

1993-11-09

King, Roy

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427249, 4272557, 4274197, 428698, B05D 306, C23C 1600

Patent

active

052601072

ABSTRACT:
This present invention provides a hard multilayer coated product comprising a hard wear-resistant titanium compound coating layer, a titanium compound layer having a compositional gradient and a self-lubricating coating layer comprising hard amorphous carbon as the principal component successively formed on the surface of a substrate, the first layer being formed at about 500.degree. C. by the plasma CVD method in a vacuum followed by the formation of the second and third layers at 250.degree. to 400.degree. C. in a vacuum maintained at the same level as above. The hard multilayer coated product is improved in wear-resistance and self-lubricity.

REFERENCES:
patent: 4686156 (1987-08-01), Baldoni, II et al.
patent: 4774130 (1988-09-01), Shiro et al.
patent: 4984940 (1991-01-01), Bryant et al.
patent: 5071693 (1991-12-01), Sue et al.
patent: 5093151 (1992-03-01), Berg et al.

Affiliated with

Also associated with

Rating

Plasma chemical vapor deposition process for producing a hard mu does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma chemical vapor deposition process for producing a hard mu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma chemical vapor deposition process for producing a hard mu will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1141416