Plasma-based debris mitigation for extreme ultraviolet (EUV)...

Details Plasma-based debris mitigation for extreme ultraviolet (EUV)... Plasma-based debris mitigation for extreme ultraviolet (EUV)...

2007-06-12

2007-06-12

Kornakov, M. (Department: 1746)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C156S345480, C156S345500, C250S493100, C250S503100, C250S505100, C250S515100, C372S005000, C355S030000

Reexamination Certificate

active

10628129

ABSTRACT:
A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber.

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