Plasma apparatus, and method and system for extracting electrica

Details Plasma apparatus, and method and system for extracting electrica Plasma apparatus, and method and system for extracting electrica

1991-07-17

1992-09-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156627, 156643, 156345, 20429832, 20429837, B44C 122

Patent

active

051474972

ABSTRACT:
A system for measuring a temperature of a high-frequency electrode of a plasma etching apparatus has a temperature detecting element for detecting a temperature, a metal sheath member in which the temperature detecting element is provided to be insulated from it and which is kept in a DC floating state, an insulating member for insulating the sheath member from the high-frequency electrode, and a filter for removing a high-frequency component of an electrical signal sent from the temperature detecting element.

REFERENCES:
patent: 4913790 (1990-04-01), Narita et al.
patent: 4956043 (1990-09-01), Kanetomo et al.
patent: 4971653 (1990-11-01), Powell et al.

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