Plasma apparatus and method

Details Plasma apparatus and method Plasma apparatus and method

1996-07-12

2000-08-29

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118718, 118719, 118723HC, 118723MP, 4272481, 427444, 427523, 427595, H05H 124

Patent

active

061105406

ABSTRACT:
A gas purged counter-electrode prevents the counter-electrode from being covered with dielectric material by flowing gas past a surface of a metal element. The gas purged counter-electrode produces a relatively high-density plasma which effectively acts as the counter-electrode for a coating system. The gas purged counter-electrodes can be used with PECVD or sputtering systems.

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Michael J. Patterson, et al., "Plasma Contactor Development for Space Station"; NASA Technical Memorandum 106425, IEPC-93-246; pp. 1-29 (1993). (No month avail.).

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