Plasma apparatus

Details Plasma apparatus Plasma apparatus

1988-05-10

1990-02-20

Laroche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511171, 118728, 118729, 118715, 118719, 2504922, H01J 724, H05B 3126, C23C 1600

Patent

active

049029347

ABSTRACT:
A plasma apparatus which is; provided with a pair of plasma generation chambers at both sides of a specimen chamber provided therein with two specimen mounts for fixing specimens to be subjected to the predetermined processing such as plasma CVD; designed to use the specimen chamber in common so as to simultaneously process by plasma generated by the pair of plasma generation chambers the specimens fixed to the two specimen mounts to thereby be compact as a whole; and provided with a load lock chamber communicated with the specimen chamber and delivering the specimens between the load lock chamber and specimen chamber, so that the plurality of specimens are contained in cassettes disposed in the load lock chamber and the contained specimens are moved between the load lock chamber and the specimen chamber by means of a loader provided in the load lock chamber, thereby enabling a rest time to be reduced and the specimen to be efficiently processed.

REFERENCES:
patent: 4550239 (1985-10-01), Uehara et al.
patent: 4641060 (1987-02-01), Dandl
patent: 4668365 (1987-05-01), Foster et al.
patent: 4713585 (1987-12-01), Ohno et al.
patent: 4724300 (1988-02-01), Dearnaley

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