Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2005-02-25
2008-05-06
Cleveland, Michael B. (Department: 1792)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230IR, C156S345480, C343S876000
Reexamination Certificate
active
07367281
ABSTRACT:
The plasma antenna is designed to allow connection between electric elements within the antenna to be varied without changing the construction of the antenna during a chemical vapor deposition process, thereby maximizing efficiency of a cleaning or deposition process. The plasma antenna comprises two or more coils to which RF power is supplied from an RF power source, respectively, and a switch connected to ends of the coils. The coils are constructed to have different impedances. The circuit construction of the plasma antenna can be changed on the basis of an inductive coupled plasma antenna so as to generate parallel connection type plasma, series connection type plasma, or capacitive coupled plasma according to the kind of process, such as cleaning or depositing, without changing the construction of the antenna, so that the process can be performed efficiently, thereby enhancing productivity through reduction in manufacturing costs attributed to the simple construction of the antenna.
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Cleveland Michael B.
Jusung Engineering Co. Ltd.
Marger Johnson & McCollom PC
Tadayyon-Eslami Tabassom
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