Plasma accelerating apparatus and plasma processing system...

Electric lamp and discharge devices – Fluent material supply or flow directing means – Plasma

Reexamination Certificate

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C313S359100, C313S362100, C315S111910, C315S111410

Reexamination Certificate

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07602111

ABSTRACT:
A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a channel comprising an inner wall, an outer wall spaced apart from the inner wall by a distance for encircling the inner wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet port at the other ends of the walls; a gas supply portion to supply a gas to an inside of the channel; and a plasma generating and accelerating portion to supply ionization energy to the gas to generate a plasma beam and to accelerate the generated plasma beam toward the outlet port, wherein a coating layer comprising a first layer composed of a carbon nano tube is formed on at least one of the inner wall, the outer wall, and the end wall of the channel.

REFERENCES:
patent: 6824363 (2004-11-01), Mitrovic et al.
patent: 6903521 (2005-06-01), Park
patent: 2003/0184235 (2003-10-01), Nakamura
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patent: 2004-353066 (2004-12-01), None
patent: 2004-0053502 (2004-06-01), None
patent: 2005/028310 (2005-03-01), None
Nozawa et al., Japanese Patent 2004-172397, Jun. 2004, machine translation.

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