Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1994-04-28
1995-08-08
Mintel, William
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257 57, 257 59, 257 72, 257292, H01L 2714
Patent
active
054401496
ABSTRACT:
An image sensor of a planar type is so arranged that a photo electric conversion layer is provided on an insulating substrate, a pair of electrodes are provided on the photoelectric conversion layer, and a p-type region and an n-type region are provided to the two electrodes respectively at locations at which light incident on a surface of said photoelectric conversion layer is unintercepted. On the photo electric conversion layer, there is a transparent protective layer but there is no p.sup.+ -type layer or a transparent electrode. The quantum efficiency and the blocking capability are enhanced with the leakage current being reduced.
REFERENCES:
patent: 4972252 (1990-11-01), Maekawa
patent: 5038190 (1991-08-01), Ito et al.
patent: 5262654 (1993-11-01), Yamazaki
Kaneko Setsuo
Shimizu Kousaku
Mintel William
NEC Corporation
Tran Minhloan
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