Planar reticle design/fabrication method for rapid...

Details Planar reticle design/fabrication method for rapid... Planar reticle design/fabrication method for rapid...

2005-07-19

2005-07-19

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S335000, C430S950000

Reexamination Certificate

active

06919146

ABSTRACT:
A reticle has a transparent substrate, mask shapes on the substrate, a transparent material covering the mask shapes and an optional anti-reflective material over the transparent material.

REFERENCES:
patent: 5780187 (1998-07-01), Pierrat
patent: 6110623 (2000-08-01), O'Grady et al.
patent: 6207330 (2001-03-01), Balz et al.
patent: 6251559 (2001-06-01), Huang et al.
patent: 6461774 (2002-10-01), Zimlich et al.
patent: 6682861 (2004-01-01), Chan
patent: 2002/0136966 (2002-09-01), Shinagawa et al.

Affiliated with

Also associated with

Rating

Planar reticle design/fabrication method for rapid... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Planar reticle design/fabrication method for rapid..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Planar reticle design/fabrication method for rapid... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3430969