Planar multi-level metal process with built-in etch stop

Details Planar multi-level metal process with built-in etch stop Planar multi-level metal process with built-in etch stop

1980-08-18

1983-01-04

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

29580, 156644, 156646, 156653, 156655, 1566611, 156668, 204192E, 357 67, 357 71, 427 89, 427 90, 430313, 430317, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

043671195

ABSTRACT:
Use of a dual composite mask for a lift-off multi-layered structure process in which a base component layer acts as an etch stop for reactive ion etching of overlying layers.

REFERENCES:
patent: 3479237 (1969-11-01), Bergh et al.
patent: 3985597 (1976-10-01), Zielinski
patent: 4028155 (1977-06-01), Jacob
patent: 4070501 (1978-01-01), Corbin et al.
patent: 4090006 (1978-05-01), Havas et al.
patent: 4155802 (1979-05-01), Yonezawa et al.
patent: 4184909 (1980-01-01), Chang et al.

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