Pixel sensor cell having reduced pinning layer barrier...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device

Reexamination Certificate

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C257SE27005, C257S046000

Reexamination Certificate

active

10907570

ABSTRACT:
A pixel sensor cell structure and method of manufacture. The pixel cell comprises a doped layer formed adjacent to a first side of a transfer gate structure for coupling a collection well region and a channel region. Potential barrier interference to charge transfer caused by a pinning layer is reduced.

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“Elimination of Parasitic Currents in Transistor-Schottky Barrier Diode Circuit”, IBM Technical Disclosure Bulletin, vol. 19, No. 7, Dec. 1976, p. 2522.

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