Pixel based machine for patterned wafers

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Details

C348S086000, C348S125000, C356S237100

Reexamination Certificate

active

07454052

ABSTRACT:
A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from the signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.

REFERENCES:
patent: 4000949 (1977-01-01), Watkins
patent: 4342515 (1982-08-01), Akiba et al.
patent: 4345312 (1982-08-01), Yasuye et al.
patent: 4423331 (1983-12-01), Koizumi et al.
patent: 4516833 (1985-05-01), Fusek
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4669875 (1987-06-01), Shiba et al.
patent: 4731855 (1988-03-01), Suda et al.
patent: 4814596 (1989-03-01), Koizumi et al.
patent: 5451773 (1995-09-01), Triner et al.
patent: 5699447 (1997-12-01), Alumot et al.
patent: 5801824 (1998-09-01), Henley
patent: 43 21 042 (1994-09-01), None
patent: 54-101390 (1979-08-01), None
patent: 55-94145 (1980-07-01), None
patent: 56-30630 (1981-03-01), None
patent: 06-242015 (1993-02-01), None
patent: 06-137239 (1994-06-01), None
patent: 08-007103 (1996-01-01), None
“Multi-Layer Coated Optics: Guided Wave Coupling and Scattering by Means of Interface Random Roughness”; Elson, J. Opt. Soc. AM. vol. 12, No. 4; Apr. 1995; pp. 729-742.
“A New Curve Detection Method: Randomized Hough Transform (RHT)”; Xu et al.; Pattern Recognition Letters 11 (1990) pp. 331-338.
“Autoranging/Autofocus: A Survey of Systems”, Part 3; Wolpert; Photonics Spectra Sep. 1987, pp. 133-141.

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