Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-01-26
2008-11-18
Carter, Aaron W (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C348S086000, C348S125000, C356S237100
Reexamination Certificate
active
07454052
ABSTRACT:
A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from the signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.
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Lapidot Zvi
Sherman Rivi
Smilansky Zeev
Tsadka Sagie
Applied Materials Inc.
Carter Aaron W
Patterson & Sheridan LLP
Sughrue & Mion, PLLC
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