Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-01-18
1998-09-22
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430 7, 4302811, 4302841, 430292, 430910, G03F 7033, G03F 7031, G02B 520, G02B 11335
Patent
active
058112197
ABSTRACT:
A pigment-dispersed photoresist composition for a color filter of liquid crystal display, which comprises a photosensitive resin composition comprising a binder resin, a multifunctional acrylate monomer or oligomer, a polyene compound containing at least unsaturated group the main chain of which may be substituted with esters or urethanes, a multifunctional thiol compound, a photopolymerization initiator, a sensitizer, a soft polymerization inhibitor and an organic solvent, and a pigment-dispersed composition comprising pigment, a polymeric dispersing agent and/or a pigment-derived dispersing agent in combination with a surfactant a leveling agent, a slip agent, an antifoaming agent and an organic solvent, is disclosed. Superior in physical properties including thermal resistance, light fastness, spectroscopicity, color reproduction (chromaticity), dispersing stability, adhesiveness to substrate, resolution and photosensitivity, the pigment-dispersed photoresist composition can afford a fine pattern with high definition.
REFERENCES:
patent: 4120721 (1978-10-01), Ketley et al.
patent: 4511645 (1985-04-01), Koike et al.
patent: 5153095 (1992-10-01), Kawamura et al.
Im Dae Woo
Kim Soon Sik
Lee Sang Woon
No Tae Whan
Cheil Synthetics Incorporation
McPherson John A.
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