Piezoelectric vaporizer

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

Reexamination Certificate

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Details

C118S715000

Reexamination Certificate

active

06926774

ABSTRACT:
An apparatus for controlling the flow of liquid material from a liquid material source to a process chamber is disclosed. The apparatus comprises an injector/vaporizer disposed proximate to the process chamber. The injector/vaporizer includes one or more piezoelectric grids located proximate to a vaporization chamber. The one or more piezoelectric grids function to control the flow of liquid material into the vaporization chamber. Each piezoelectric grid includes interlocking arrays of stripes attached to a frame.

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patent: 5299919 (1994-04-01), Paul et al.
patent: 5630878 (1997-05-01), Miyamoto et al.
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 5925189 (1999-07-01), Nguyen et al.
patent: 5989635 (1999-11-01), Kawahara et al.
patent: 6176930 (2001-01-01), Koai et al.
patent: 6267820 (2001-07-01), Chen et al.

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