Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Reexamination Certificate
2005-08-09
2005-08-09
Hassanzadal, P. (Department: 1763)
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
C118S715000
Reexamination Certificate
active
06926774
ABSTRACT:
An apparatus for controlling the flow of liquid material from a liquid material source to a process chamber is disclosed. The apparatus comprises an injector/vaporizer disposed proximate to the process chamber. The injector/vaporizer includes one or more piezoelectric grids located proximate to a vaporization chamber. The one or more piezoelectric grids function to control the flow of liquid material into the vaporization chamber. Each piezoelectric grid includes interlocking arrays of stripes attached to a frame.
REFERENCES:
patent: 4748313 (1988-05-01), de Rudnay
patent: 4875658 (1989-10-01), Asai
patent: 5299919 (1994-04-01), Paul et al.
patent: 5630878 (1997-05-01), Miyamoto et al.
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 5925189 (1999-07-01), Nguyen et al.
patent: 5989635 (1999-11-01), Kawahara et al.
patent: 6176930 (2001-01-01), Koai et al.
patent: 6267820 (2001-07-01), Chen et al.
Huston Joel M.
Yoshidome Ted G.
Applied Materials Inc.
Hassanzadal P.
MacArthur Sylvia R.
Moser Patterson & Sheridan LLP
LandOfFree
Piezoelectric vaporizer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Piezoelectric vaporizer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Piezoelectric vaporizer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3504946