Physical vapor deposition target constructions

Details Physical vapor deposition target constructions Physical vapor deposition target constructions

2005-09-23

2009-11-17

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298130

Reexamination Certificate

active

07618520

ABSTRACT:
The invention includes a target construction having a sputtering region and a flange region laterally outward relative to the sputtering region. The flange region has a front surface disposed on a front face of the construction and a back surface opposing the front surface. An o-ring groove is disposed within the flange region. The o-ring groove has a planar base surface which has a first width and has an orifice disposed along the front surface of the flange. The orifice has a second width as measured parallel relative to the base surface. The second width is greater than the first width. The flange surfaces can additionally be protected from rubbing by a layer of protective material.

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patent: 0780487 (1997-06-01), None
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