Phototreating method and apparatus therefor

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156646, 20419232, H01L 21306

Patent

active

048447749

ABSTRACT:
A phototreating method comprises the steps of introducing a photoreactive gas into a chamber housing a workpiece, emitting first light substantially perpendicularly to a surface of the workpiece, and emitting second light substantially perpendicularly to the surface of the workpiece simultaneously with or after radiation of the first light. The surface of the workpiece is treated utilizing a photochemical reaction of the photoreactive gas caused by radiation of the first light and/or the second light.

REFERENCES:
patent: 4529475 (1985-07-01), Okano et al.
patent: 4599135 (1986-07-01), Tsunekawa et al.
patent: 4609566 (1986-09-01), Hongo et al.
patent: 4615765 (1986-10-01), Levinson et al.
patent: 4668337 (1987-05-01), Sekine et al.

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