Photosolubilizable compositions containing novolac phenolic resi

Details Photosolubilizable compositions containing novolac phenolic resi Photosolubilizable compositions containing novolac phenolic resi

1986-07-08

1987-11-24

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430280, 430326, 522 31, 522156, G03C 176

Patent

active

047089253

ABSTRACT:
Radiation-sensitive elements, e.g. printing plates, comprising a substrate having coated thereon a photosolubilizable composition comprising an alkali-soluble phenolic resin and an onium salt. The onium salt imparts a solvent resistance to the phenolic resin which is removed upon exposure to radiation thereby providing a solubility differential between exposed and unexposed areas of the composition.

REFERENCES:
patent: 4026705 (1977-05-01), Crivello et al.
patent: 4058401 (1977-11-01), Crivello
patent: 4102687 (1978-07-01), Crivello
patent: 4138255 (1979-02-01), Crivello
patent: 4173551 (1979-11-01), Crivello
patent: 4193799 (1980-03-01), Crivello
patent: 4230814 (1980-10-01), Crivello
patent: 4247611 (1981-01-01), Sander et al.
patent: 4247616 (1981-01-01), Vikesland et al.
patent: 4398014 (1983-08-01), Green et al.

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