Photosensitve polymide precursor and its use for pattern formati

Details Photosensitve polymide precursor and its use for pattern formati Photosensitve polymide precursor and its use for pattern formati

1997-06-16

2000-02-15

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

528 33, 528229, 528321, 528331, G03F 7038

Patent

active

060251131

ABSTRACT:
A polyimide precursor having repeating units of the formula: ##STR1## wherein R.sup.1 is a tetravalent organic group having 4 or more carbon atoms; R.sup.2 is a trivalent or tetravalent organic group having one or more aromatic rings; R.sup.3 is a monovalent organic group; A is a monovalent group showing acidity; and n is an integer of 1 or 2, is effective for preparing a highly sensitive negative-working photosensitive material developable with an alkaline aqueous solution in a short time with high resolution.

REFERENCES:
patent: 3692740 (1972-09-01), Suzuki et al.
patent: 5281690 (1994-01-01), Flaim
patent: 5310862 (1994-05-01), Nomura et al.
patent: 5516875 (1996-05-01), Simmons, III
patent: 5591250 (1997-01-01), Stern et al.
patent: 5741599 (1998-04-01), Oie et al.
Database WPIL in Questel, London: Derwent Publications Ltd., AN7-179604, JP 7-179604 (Nitto Denko Corp.), abstract.

Affiliated with

Also associated with

Rating

Photosensitve polymide precursor and its use for pattern formati does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitve polymide precursor and its use for pattern formati, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitve polymide precursor and its use for pattern formati will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1904536