Photosensitive systems showing visible indication of exposure

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

430341, 430292, 430340, 430338, 430343, 430344, 430342, 430922, 430921, 430925, 430270, 252586, G03C 168, G03C 1727

Patent

active

046596496

ABSTRACT:
The invention provides new compositions which change color on exposure to actinic radiation and contain a photosensitive onium, e.g. iodonium or sulphonium, salt and a dyestuff which changes color when protonated. The compositions may also include a resin, especially a resin curable by the onium salt when the latter is exposed, and preferably an epoxy resin. The compositions are useful especially as coatings, e.g. for making screen stencils or for producing lithographic printing plates.

REFERENCES:
patent: 2066913 (1937-01-01), Schmieg
patent: 2618555 (1952-11-01), Reichel
patent: 3598592 (1971-08-01), Cescon
patent: 3729313 (1973-04-01), Smith
patent: 4026705 (1977-05-01), Crivello et al.
patent: 4163672 (1979-08-01), Stahlhofen
patent: 4193799 (1980-03-01), Crivello
patent: 4264703 (1981-04-01), Crivello
patent: 4350753 (1982-09-01), Shelnut et al.
patent: 4548890 (1985-10-01), Dickinson et al.
"Applications of Photoinitiated Cationic Polymerization Toward the Development of New Photoresists", by J. V. Crivello, A.C.S. Div of ORPL Papers, 48, (1983).
"Photoinitiated Catonic Polymerization by Sulphonium Salts", by J. V. Crivello, General Electric Company, Schenectacy, New York.

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