Photosensitive structure for flexographic printing

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S306000, C430S300000, C430S286100, C430S287100

Reexamination Certificate

active

07544463

ABSTRACT:
A photosensitive structure for flexographic printing having a support (A) and, laminated thereon, an adhesive layer (B) and a photosensitive resin layer (C) different from said adhesive layer (B), wherein said adhesive layer (B) is an adhesive layer (B) comprising a thermoplastic elastomer (a) derived from at least one monovinyl substituted aromatic hydrocarbon and a conjugated diene, at least one ethylenically unsaturated compound (b) and at least one polymerization initiator (c), wherein said ethylenically unsaturated compound (b) comprises at least one (meth)acrylate (i) having one or more aromatic rings and/or one or more hydroxyl groups in the molecule thereof.

REFERENCES:
patent: 4248960 (1981-02-01), Hein et al.
patent: 4320188 (1982-03-01), Heinz et al.
patent: 4401749 (1983-08-01), Hoffmann et al.
patent: 4459348 (1984-07-01), Jun et al.
patent: 4720448 (1988-01-01), Mousseau
patent: 4925769 (1990-05-01), Huemmer et al.
patent: 5175072 (1992-12-01), Martens
patent: 6037102 (2000-03-01), Loerzer et al.
patent: 0 055 807 (1982-07-01), None
patent: 0 059 385 (1982-09-01), None
patent: 0 333 012 (1999-09-01), None
patent: 2270990 (1994-03-01), None
patent: 59-054600 (1984-03-01), None
patent: 1-296252 (1989-11-01), None
patent: 2-8849 (1990-01-01), None
patent: 2-8851 (1990-01-01), None
patent: 4-204447 (1992-07-01), None
patent: 6-214378 (1994-08-01), None
patent: 8-297369 (1996-11-01), None
patent: 2000-155410 (2000-06-01), None
patent: 2000-258898 (2000-09-01), None
patent: 2001-264959 (2001-09-01), None
English translation, Machine generated, of JP 08-297369-A 16 pages From JPO and INPIT using dictionsre in Chemistry Natural sicence and JIS terms. Translation generated Mar. 20, 2007. from http://dossier.ipdl.ncipi.go.jp/text—trans.html and AIPN and Japan Patent Office website.
English abstract from WPI/Thomson of JP1982016405 19820922 of which JP59054600A was one member , 1 page, year of abstract 1984, no month.Inventor Kawamoto et al.
English abstract from WPI/Thomson of JP19820164105 19820922 of which JP59054600A was one member, 1 page, year of abstract 1984 no month. Inventor Kawamoto et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive structure for flexographic printing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive structure for flexographic printing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive structure for flexographic printing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4088069

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.