Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-05-16
1999-04-06
Chea, Thorl
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430171, 430198, 522 71, G03C 1492
Patent
active
058916040
ABSTRACT:
The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
REFERENCES:
patent: 4598037 (1986-07-01), Felten
patent: 5009972 (1991-04-01), Higuchi et al.
Katoh Toshihiro
Kawai Takashi
Kuriyama Takao
Munemoto Eiji
Murakami Hiroshi
Chea Thorl
Dai Nippon Printing Co.,Ltd.
Nippon Hoso Kyokai
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