Photosensitive silane coupling agent, method of forming...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S313000, C430S315000, C430S319000, C430S320000, C430S321000, C430S322000, C430S323000, C430S324000, C430S325000, C430S326000, C430S327000, C430S331000, C430S270100, C430S005000, C556S420000, C556S422000

Reexamination Certificate

active

07547503

ABSTRACT:
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group.

REFERENCES:
patent: 5692003 (1997-11-01), Wingreen et al.
patent: 6755953 (2004-06-01), Baba
patent: 7022463 (2006-04-01), Yamaguchi et al.
patent: 7079250 (2006-07-01), Mukai
patent: 7204915 (2007-04-01), Kitade et al.
patent: 7220482 (2007-05-01), Mino et al.
patent: 2004/0223142 (2004-11-01), Inao et al.
patent: 2007/0059211 (2007-03-01), Edmiston
patent: 2007/0141483 (2007-06-01), Yamaguchi et al.
patent: 2007/0212806 (2007-09-01), Ito
patent: 10-12968 (1998-01-01), None
patent: 11-218627 (1999-08-01), None
patent: 2001-168317 (2001-06-01), None
patent: 2003-168606 (2003-06-01), None
patent: 2003-268592 (2003-09-01), None
patent: 2003-321479 (2003-11-01), None
patent: 2005-190624 (2005-07-01), None
Aránzazu del Campo, et al., “Surface Modification with Orthogonal Photosensitive Silanes for Sequential Chemical Lithography and Site-Selective Particle Deposition”, Angew. Chem. Int. Ed., vol. 44, 2005, pp. 4707-4712.
Jamila Jennane, et al, “Photolithography of self-assembled monolayers: optimization of protecting groups by an electroanalytical method”, Can. J. Chem., vol. 74, 1996, pp. 2509-2517.
Takashi Tamura, et al., “Synthesis of mesoporous thin film containing 2-nitrobenzyl group and introduction of carboxy groups patterned on the surface by photoirradiation”, Polymer Preprints, Japan, vol. 53, No. 2, 2004, p. 4196. (with translation).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive silane coupling agent, method of forming... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive silane coupling agent, method of forming..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive silane coupling agent, method of forming... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4131260

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.