Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-07-04
2006-07-04
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S944000
Reexamination Certificate
active
07070906
ABSTRACT:
A photosensitive resin laminate comprising at least a support, a photosensitive resin layer and an IR ablation layer, wherein the IR ablation layer comprises an IR absorbent metal layer which is disposed in contact with the photosensitive resin layer.
REFERENCES:
patent: 4132168 (1979-01-01), Peterson
patent: 5719009 (1998-02-01), Fan
patent: 6238837 (2001-05-01), Fan
patent: 6245486 (2001-06-01), Teng
patent: 2001/0038975 (2001-11-01), Daems et al.
patent: 1 146 392 (2001-10-01), None
patent: 1382446 (2004-01-01), None
patent: WO 94/03838 (1993-08-01), None
patent: WO 01/63364 (2001-08-01), None
European Search Report mailed Nov. 7, 2005, directed to EP Application No. 04014285.3.
Imahashi Satoshi
Matsuda Masaou
Motoi Keiichi
Syoki Koji
Taguchi Yuji
Hamilton Cynthia
Morrison & Foerster / LLP
Toyo Boseki Kabushiki Kaisha
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