Photosensitive resin composition with polymer having an ionic gr

Details Photosensitive resin composition with polymer having an ionic gr Photosensitive resin composition with polymer having an ionic gr

1997-03-10

2000-12-12

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302841, 4302871, 430306, G03F 7037

Patent

active

061596582

ABSTRACT:
Disclosed are a photosensitive resin composition for printing plate materials, which comprise a polymer having an ionic group and a polymerizable group in the side chain, and a printing plate material as formed by applying the composition onto a support. The hardness of the photosensitive layer of the composition is hardly influenced by temperature and water, and the layer, after having been developed, has good resistance to aqueous ink.

REFERENCES:
patent: 4263394 (1981-04-01), Gatos et al.
patent: 4511645 (1985-04-01), Koike et al.
patent: 5102773 (1992-04-01), Littmann et al.
patent: 5916731 (1999-06-01), Tanaka et al.

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