Photosensitive resin composition with polyamic acid polymer

Details Photosensitive resin composition with polyamic acid polymer Photosensitive resin composition with polyamic acid polymer

1990-11-28

1993-08-24

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430191, 430192, 430196, 430197, 430906, 522137, 522139, 522140, 522136, G03F 7028, G03F 7027

Patent

active

052387844

ABSTRACT:
The present invention provides a photosensitive resin composition which comprises, as essential components:

REFERENCES:
patent: 4451551 (1984-05-01), Kataoka et al.
patent: 4547455 (1985-10-01), Hiramoto et al.
patent: 4587197 (1986-05-01), Kojima et al.
patent: 4608333 (1986-08-01), Ohbayashi et al.
Patent Abstracts of Japan, vol. 12, No. 159 (C-495)(3006) 14 May 1988, & JP-A-62 273260 (Asahi Chem Ind.) 27 Nov. 1987.

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