Photosensitive resin composition which is improved with respect

Details Photosensitive resin composition which is improved with respect Photosensitive resin composition which is improved with respect

1985-03-07

1987-12-29

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430306, 522 96, 522 78, 522 79, G03C 168, G03C 170

Patent

active

047160942

ABSTRACT:
A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing by exposure to actinic radiation is disclosed. Further, there is disclosed a method of preparing a surface-tack free photocured pattern structure using the photosensitive resin composition, which enables pattern structures improved with respect to surface tack-free characteristic to be obtained in a shortened period of time.

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Chemical Abstract, vol. 87, No. 16, p. 63, No. 118959u.
Chemical Abstract, vol. 86, No. 18, p. 665, No. 131160a.

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