Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-12-28
1999-03-23
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302811, 4302881, 4302851, 522 4, 522 12, G03F 7029, G03F 7031, G03F 7033, G03F 7037
Patent
active
058857460
ABSTRACT:
A photosensitive resin composition comprising a high polymer binder, a monomer, a photopolymerization initiator generating a radical on exposure to visible light of a wavelength of 400 to 700 nm such as triazine compounds, titanocene compounds, or acridine compounds, an optically-activated acid generating agent generating an acid on exposure to light of a wavelength of 200 to 380 nm, and a color former developing a color in the presence of an acid, and a method manufacturing a printing master plate comprising the steps of exposing a photosensitive printing plate which has a laminated layer made from a photosensitive resin composition thereon to visible light of wavelength in the range of 400 to 600 nm selectively in an imagewise configuration in order to harden the resin composition layer, developing the photosensitive printing plate, and further exposing the developed plate to light of a wavelength in the range 200 to 380 nm.
REFERENCES:
patent: 3106466 (1963-10-01), Sprague et al.
patent: 4239609 (1980-12-01), Barzynski et al.
patent: 4258123 (1981-03-01), Nagashima et al.
patent: 4425424 (1984-01-01), Altland et al.
patent: 4659649 (1987-04-01), Dickinson et al.
patent: 4774163 (1988-09-01), Higashi
patent: 4816379 (1989-03-01), Bronstert et al.
patent: 4845011 (1989-07-01), Wilczak et al.
patent: 5030548 (1991-07-01), Fujikura et al.
patent: 5130228 (1992-07-01), Wade et al.
patent: 5212307 (1993-05-01), Wilczak
patent: 5322762 (1994-06-01), Kushi et al.
patent: 5330882 (1994-07-01), Kawaguchi et al.
patent: 5453340 (1995-09-01), Kawabata et al.
patent: 5472991 (1995-12-01), Schmitt et al.
Iwai Takeshi
Komano Hiroshi
Hamilton Cynthia
Tokyo Ohka Kogyo Co. Ltd.
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