Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-10-15
2000-06-20
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
2523014R, 313582, 445 24, G03F 7032, C09K 1108, H01J 1749, H01J 900
Patent
active
060776471
ABSTRACT:
Disclosed are a photosensitive resin composition which comprises:
REFERENCES:
Japanese Patent Abstract of JP 6-273925, Sep. 1994.
Kakumaru Hajime
Kamijima Koichi
Nojiri Takeshi
Tai Seiji
Tanaka Hiroyuki
Ashton Rosemary
Baxter Janet
Hitachi Chemical Co. Ltd.
LandOfFree
Photosensitive resin composition, photosensitive film and proces does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive resin composition, photosensitive film and proces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition, photosensitive film and proces will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1850705