Photosensitive resin composition, photosensitive element,...

Details Photosensitive resin composition, photosensitive element,... Photosensitive resin composition, photosensitive element,...

2004-11-02

2009-11-03

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S905000, C430S913000, C430S311000, C430S315000, C523S415000

Reexamination Certificate

active

07611818

ABSTRACT:
A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated bond, (C) a photopolymerization initiator and (D) a compound represented by the following general formula (1) or (2).[Chemical Formula 1][wherein X1, X2, X3, X4, X5and X6each independently represent a CH group, CCH3group, CC2H5group or nitrogen, Y1, Y2, Y3and Y4each independently represent optionally substituted aryl, and Y5represents optionally substituted arylene].

REFERENCES:
patent: 3479135 (1969-11-01), Pray et al.
patent: 3479185 (1969-11-01), Chambers
patent: 3647467 (1972-03-01), Grubb
patent: 3751259 (1973-08-01), Bauer et al.
patent: 5476690 (1995-12-01), Ohta et al.
patent: 6060215 (2000-05-01), Amanokura et al.
patent: 2003/0186165 (2003-10-01), Gries et al.
patent: 2027467 (1971-12-01), None
patent: 0000220 (1979-01-01), None
patent: 0000589 (1979-02-01), None
patent: 0011786 (1980-06-01), None
patent: 60-238830 (1985-11-01), None
patent: 62-180355 (1987-08-01), None
patent: 02-135351 (1990-05-01), None
patent: 05-011439 (1993-01-01), None
patent: 06-069631 (1994-03-01), None
patent: 11-327137 (1999-11-01), None
patent: 2000-214583 (2000-08-01), None
patent: 2003-295426 (2003-10-01), None
International Search Report issued in corresponding application No. PCT/JP2004/016255 completed Jan. 21, 2005 and mailed Feb. 8, 2005.

Affiliated with

Also associated with

Rating

Photosensitive resin composition, photosensitive element,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive resin composition, photosensitive element,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition, photosensitive element,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4059386