Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-04-26
1998-05-26
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 430911, 522 95, 522 88, G03F 7027
Patent
active
057562610
ABSTRACT:
Disclosed is a photosensitive resin composition suitable as a resist material against sandblasting for pattern-wise engraving of the surface of a body after photo-lithographic patterning, which comprises: (a) a urethane compound having a (meth)acrylate group at the molecular end, which is obtained from a polyether or polyester compound having a hydroxy group at the molecular chain end, a diisocyanate compound and a (meth)acrylate compound having a hydroxy group; (b) an alkali-soluble polymeric compound having an acid value in the range from 50 to 250 mg KOH/g; and (c) a photopolymerization initiator.
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patent: 4458007 (1984-07-01), Geissler et al.
patent: 4587186 (1986-05-01), Nakamura et al.
patent: 4705740 (1987-11-01), Geissler et al.
Mizusawa Ryuma
Obiya Hiroyuki
Takehana Hiroshi
Yamamoto Tetsuo
Hamilton Cynthia
Matsushita Electronics Corporation
Tokyo Ohka Kogyo Co. Ltd.
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