Photosensitive resin composition for optical waveguides, and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

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C385S143000, C385S131000, C430S284100, C522S096000

Reexamination Certificate

active

07569335

ABSTRACT:
There is provided a photosensitive resin composition for forming an optical waveguide which has high shape precision and excellent transmission characteristics under high temperature and high humidity. A composition of the present invention contains (A) a polymer having structures represented by the following general formulae (I) and (2)(in the formulae, each of R1and R2is independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R3is an organic group containing a radical-polymerizable reactive group; X is a single bond or a bivalent organic group; and Y is a non-polymerizable organic group), (B) a compound having at least one ethylenic unsaturated group in the molecule thereof, having a molecular weight below 1,000 and having a boiling point of at least 130° C. at 0.1 MPa, and (C) a photoradical polymerization initiator.

REFERENCES:
patent: 6023547 (2000-02-01), Tortorello
patent: 2003/0026569 (2003-02-01), Eldada et al.
patent: 06-230212 (1994-08-01), None
patent: 2000-180643 (2000-06-01), None
patent: 2002-229208 (2002-08-01), None
patent: 2003-149475 (2003-05-01), None
patent: 2003-195079 (2003-07-01), None
PTO 08-2472, English translation of Ohara et al, JP 2002-229208 A, United States Patent and Trademark Office,, Washington, D.C., Feb. 2008, tagged as Document No. 02-229208, but actually 2002-229208 as evidenced by Matching application No. with JP 2002-31063A, Date of Translation: Feb. 2008, Translated by FLS. Inc. 24 pages.
English translation of JP, 2003-149475, A (2003) from machine translation from AIPN Japan Patent Office Natinal center for Industrial Property Information and Training, generated Jun. 19, 2008, 6 pages.
Sugai et al (AN 1995:441140) from ACS on STN file CAPLUS entered Mar. 25, 1995 one page.
Sugai et al (Publication No. 06-230212 Patent Abstracts of Japan and attached English machine translation of JP 06-230212 A from PAJ www19.ipdl.ncipi.go.jp, genereated on Nov. 27, 2006.

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