Photosensitive resin composition for flexographic printing

Details Photosensitive resin composition for flexographic printing Photosensitive resin composition for flexographic printing

1993-02-08

1993-10-19

Camish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430917, 430918, 430950, G03C 1492

Patent

active

052544370

ABSTRACT:
Disclosed is a photosensitive resin plate which effectively prevents dot gain by covering the photosensitive resin layer with a specific matte layer. The photosensitive resin plate comprises a substrate, a photosensitive resin layer formed on the substrate and a resin matte layer formed on the photosensitive resin layer, wherein the resin matte layer contains a polymerization inhibiting material.

REFERENCES:
patent: 4126460 (1978-11-01), Okishi
patent: 4842982 (1989-06-01), Seibel et al.
No. 18056, "A light-sensitive material having a matting layer", Research Disclosure, Apr. 1979, pp. 160-161.
D. L. Flowers et al, "Lubrication and Pattern Improvement in Photolithography", J. of the Electrochemical Society, vol. 127, No. 7, 1980, pp. 1579-1582.

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