Photosensitive resin composition for black matrix

Details Photosensitive resin composition for black matrix Photosensitive resin composition for black matrix

2007-01-18

2008-11-11

Schilling, Richard (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S285100, C430S905000

Reexamination Certificate

active

07449281

ABSTRACT:
A photosensitive resin composition for a black matrix comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) a solvent; and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a functional group having a general formula (a-1); viscosity of said photosensitive resin composition for the black matrix is 0.5-4.0 cps at 25° C.; the solid content of said photosensitive resin composition is 5-17.5 wt. %; and said solvent (D) has a saturated vapor pressure below 4.5 mmHg at 20° C.; which presents no pinhole on the surface after low pressure drying, no line and cloud defect on the film, good inner uniformity of the coated film and high photosensitivity after pre-bake, high heat resistance for black matrix after post-bake, especially no poor coating on substrates of LCD by the slit coating.(Each of R is independently H, linear or branch alkyl of C1-C5, phenyl or halogen.)

REFERENCES:
patent: 8-278629 (1996-10-01), None
patent: 2002-145999 (2002-05-01), None
patent: 2003-29397 (2003-01-01), None
patent: 2003-57431 (2003-02-01), None
patent: 2004-233981 (2004-08-01), None
patent: 2004-233993 (2004-08-01), None
patent: 2004-233997 (2004-08-01), None
patent: 2004-233998 (2004-08-01), None
Kitamura, Japanese Journal nmed Display, “Technology and Apparatus for Manufacturing Large-Sized Substrates of Color Filters of the Fifth Generation with the Slit Coating Process”, Nov. 2002, pp. 36-41.
Japanese Journal named Electric Material, “Manufacturing of Substrates for Planar Displays with the Slit Coating Process”, Jun. 2002, pp. 107-112.

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