Photosensitive resin composition comprised of a polymer obtained

Details Photosensitive resin composition comprised of a polymer obtained Photosensitive resin composition comprised of a polymer obtained

1982-04-20

1984-06-12

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 430925, 20415916, 20415918, G03C 170

Patent

active

044542194

ABSTRACT:
A photosensitive resin composition comprising (a) a polymer obtained by using an aliphatic amino group-containing monomer as a comonomer, (b) an ethylenic unsaturated compound, (c) a photosensitizer and/or a photosensitizer system and (d) an organic halogen compound shows high photosensitivity and excellent resistance to plating and is usable as plating resists or etching resists.

REFERENCES:
patent: 3961961 (1976-06-01), Rich
patent: 4071425 (1978-01-01), Guarino et al.

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