Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-01-13
1998-05-12
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430909, 522101, G03F 7028, G03F 7032
Patent
active
057503133
ABSTRACT:
Disclosed are a photosensitive resin composition essentially comprising 100 parts by weight of modified polyvinyl alcohol comprising a structural units of formulae (I), (II) and (III): ##STR1## wherein R represents a hydrocarbon group having 1 to 20 carbon atoms; X represents an aliphatic, alicyclic or aromatic divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent group having at least one carboxyl group in the molecule thereof, the proportion of the structural unit of formula (I) being from 1 to 40 mol %, the total proportion of the structural units of formulae (II) and (III) being from 60 to 99 mol %, and the carboxyl equivalent attributed to the structural unit of formula (III) being from 0.3 to 5 mol/kg, (B) from 0.1 to 10 parts by weight of an unsaturated epoxy compound, (C) from 20 to 200 parts by weight of a polymerizable unsaturated compound having an ethylenical double bond in the molecule thereof, and (D) from 0.1 to 10 parts by weight of a photopolymerization initiator. A photosensitive resin composition containing modified polyvinyl alcohol obtained by reacting partially saponified polyvinyl alcohol having a degree of saponification of 60 to 99 mol % and a number average degree of polymerization of 300 to 2,000 with a carboxylic acid anhydride in a molten state is also disclosed. Additionally, and a process for producing a photopolymerizable resin composition comprising reacting partially saponified polyvinyl alcohol having a degree of saponification of 60 to 99 mol % and a number average degree of polymerization of 300 to 2,000 with a carboxylic acid anhydride in a molten state to prepare (A-2) modified polyvinyl alcohol and mixing modified polyvinyl alcohol (A-2) with (C) a polymerizable unsaturated compound having an ethylenical double bond in the molecule thereof, and (D) a photopolymerization initiator is disclosed. The photosensitive resin compositions provide a printing plate material having high sensitivity and highly precise image reproducibility, from which material is obtained a printing plate whose relief has excellent toughness. The use of the modified polyvinyl alcohol obtained by a molten reaction makes it easy to prepare a solution of a photosensitive resin composition.
REFERENCES:
patent: 2902365 (1959-09-01), Martin
patent: 3899338 (1975-08-01), Lewis
patent: 4092443 (1978-05-01), Green
patent: 4340686 (1982-07-01), Foss
patent: 4517277 (1985-05-01), Lynch et al.
patent: 4600746 (1986-07-01), Schmukler et al.
patent: 4606993 (1986-08-01), Fujikawa et al.
patent: 5364736 (1994-11-01), Eramo, Jr. et al.
patent: 5369168 (1994-11-01), Famili et al.
PTO 96-2384, English Translation of Japan Kokai 04-283749 (Kashio et al) made by U.S. Patent and Trademark Office Mar. 1996(Schreiber Translation, Inc.)
Adachi Tamio
Kashio Shigetora
Tamada Hiroshi
Hamilton Cynthia
Miller Austin R.
Toray Industries Inc.
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