Photosensitive resin composition and photosensitive element usin

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430284, 522 96, 522148, G03C 1725

Patent

active

052622770

ABSTRACT:
A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.

REFERENCES:
patent: 4416973 (1983-11-01), Goff
patent: 4654415 (1987-03-01), Ahne et al.

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