Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-03-10
2000-10-24
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302871, 4302851, 522 84, 522 75, 522121, G03C 172, G03C 1725, G03C 173, G03C 174
Patent
active
061365076
ABSTRACT:
A photosensitive resin composition developable with water or a diluted alkali solution comprises the following components (A) to (D). That is, the component (A) is a water-soluble photosensitive resin selected from the group consisting of a first resin obtained by introducing a styryl pyridinium group into a polyvinyl alcohol polymer, a second resin obtained by introducing a styryl quinolinium group into the polyvinyl alcohol polymer, and a third resin obtained by adding N-alkylol (meth) acrylamide to the polyvinyl alcohol polymer. The component (B) is a photosensitive prepolymer having a carboxyl group and at least two ethylenically unsaturated groups in molecule. The component (C) is a photopolymerization initiator. The component (D) is water. The photosensitive resin composition will be preferably used as a photoresist ink for manufacturing printed wiring boards.
REFERENCES:
patent: 4209581 (1980-06-01), Takanashi et al.
patent: 4272620 (1981-06-01), Ichimura
patent: 4564580 (1986-01-01), Ichimura et al.
European Search Report dated Jul. 5, 1999 for EP Application No. 99104757.2-1217.
Baxter Janet
Goo Chemical Co., Ltd.
Lee Sin J.
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