Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-03-27
2000-05-09
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430320, 430328, G03F 7037
Patent
active
060602155
ABSTRACT:
A photosensitive resin composition comprising (A) a resin having an amide bond, an oxyalkylene group and a carboxyl group, (B) a photopolymerizable compound having an ethylenically unsaturated group and (C) a photopolymerization initiator has an alkali developability, good sensitivity and photocurability, an efficient pattern formability by photolithography, a good application workability to a film and is capable of producing cured products having good folding endurance, solder reflow heat resistance, solvent resistance, bondability and nonflammability and suitable for producing a photosensitive element, a photosensitive laminate and a flexible printed circuit board.
REFERENCES:
patent: 4777115 (1988-10-01), Koch et al.
patent: 5236809 (1993-08-01), Onodera et al.
patent: 5648198 (1997-07-01), Shibata
Akahori Toshihiko
Amanokura Jin
Hirakura Hiroaki
Hirayama Takao
Nishizawa Hiroshi
Ashton Rosemary
Baxter Janet
Hitachi , Ltd.
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