Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-06-17
1993-04-20
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430280, 430281, 522 68, 522 67, G03C 1492, G03C 1725, C08F 246, G03F 7025
Patent
active
052042189
ABSTRACT:
Disclosed herein is a photosensitive resin composition containing:
REFERENCES:
patent: 4022617 (1977-05-01), McGuckin
patent: 4603101 (1986-07-01), Crivello
patent: 4996136 (1991-02-01), Houlihan et al.
"Acid Hardening Positive Photoresist Using Photochemical Generation of Base", Journal of Photopolymer Science and Technology, by Mark R. Winkle et al, vol. 3, No. 3, pp. 419-422, 1990.
"Aqueous Base Developable Deep UV Resist Systems Based on Novel Monomeric and Polymeric Dissolution Inhibitors", SPIE, vol. 920 Advances in Resist Technology and Processing V, by Hiroshi Ito, pp. 33-41, 1988.
Horibe Hideo
Koezuka Hiroshi
Kubota Shigeru
Kumada Teruhiko
Tanaka Youko
Berman Susan
McCamish Marion E.
Mitsubishi Denki & Kabushiki Kaisha
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