Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-01-02
1985-10-01
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415919, 20415922, 430283, 430284, 430906, 528 68, 525424, 525440, 525452, G03C 168
Patent
active
045446245
ABSTRACT:
The invention provides a photosensitive resin composition containing a soluble synthetic linear high-molecular compound in an amount of 25 to 95 weight percent based on the whole composition, a monomer having at least one photopolymerizable unsaturated bond and a photopolymerization initiator and characterized in that part or all of the soluble synthetic linear high-molecular compound is an addition polymer of an organic diisocyanate compound with an amide compound, both terminals of the amide compound being either primary or secondary amide groups and the equivalent ratio of amino groups to isocyanate groups in the addition polymer is not less than 1.0. The high-molecular weight compound makes up at least 50% by weight base on the total amount of the polymer material present in the composition.
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patent: 4234399 (1980-11-01), McDowell et al.
patent: 4250248 (1981-02-01), Faust
Etoh Kuniomi
Fujimura Toshiaki
Nanpei Masaru
Tomita Akira
Brammer Jack P.
Toyo Boseki Kabnushiki Kaisha
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