Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-04-03
1993-06-22
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
522116, 522117, 430909, G03F 7033
Patent
active
052215890
ABSTRACT:
Disclosed is a photosensitive resin composition which, can be hot melt molding and and is water-developable. The composition does not need the preliminary exposure process and when cured has suitable hardness and printing properties. The photosensitive resin composition comprises;
REFERENCES:
patent: 3551148 (1970-12-01), Faulhaber
patent: 4209581 (1980-06-01), Takanashi et al.
patent: 4507382 (1985-03-01), Rousseau et al.
patent: 4604343 (1986-08-01), Sakurai et al.
Arimatsu Seiji
Kanda Kazunori
Kawaguchi Chitoshi
Nanba Osamu
Hamilton Cynthia
Nippon Paint Co. Ltd.
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