Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-01-15
1995-12-05
Hampton-Hightower, P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430195, 430196, 430283, 430296, 528 26, 528170, 528171, 528172, 528173, 528174, 528179, 528183, 528185, 528220, 528229, 528335, 528336, 528341, 528342, 528345, 528351, 528353, G03C 168, C08G 7310
Patent
active
054728231
ABSTRACT:
A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.
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Hagiwara Hideo
Kaji Makoto
Kojima Yasunori
Nishizawa Hiroshi
Suzuki Kenji
Hampton-Hightower P.
Hitachi Chemical Co. Ltd.
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