Photosensitive resin composition

Details Photosensitive resin composition Photosensitive resin composition

1977-03-29

1981-06-09

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430285, 430905, 20415915, 20415922, G03C 168

Patent

active

042726077

ABSTRACT:
A photosensitive resin composition comprising (a) a linear polymer or copolymer having tetrahydrofurfuryl groups at side chains, (b) one or more photopolymerizable unsaturated compounds having at least two terminal ethylene groups, and (c) one or more sensitizers which initiate polymerization of said unsaturated compounds by irradiation of active light, has excellent storage stability and photosensitivity. The composition can produce permanent protective films having excellent resistance to solvents, heat resistance and the like and can be used as a solder resist and the like.

REFERENCES:
patent: 2757090 (1956-07-01), Neugebauer et al.
patent: 3738973 (1973-06-01), Augarten et al.
patent: 3773515 (1973-11-01), Yamashita et al.
patent: 3795640 (1974-03-01), Pande et al.
patent: 3804628 (1974-04-01), Osada et al.
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 3881935 (1975-05-01), Apellaniz
patent: 4025348 (1977-05-01), Tsukada et al.
patent: 4028108 (1977-06-01), Van Royen

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