Photosensitive resin composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430271, 430910, 430919, 430920, 522 25, 522 63, B03C 173

Patent

active

049802666

ABSTRACT:
A photosensitive resin composition comprising (A) a carboxyl group-containing film-forming property imparting polymer, (B) a copolymerizable vinyl compound, (C) a photopolymerization initiator, and (D) a 1,2,3-benzotriazole derivative is useful for forming a photosensitive film excellent in resistance to plating and stability.

REFERENCES:
patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4289843 (1981-09-01), Boutle et al.
patent: 4320189 (1982-03-01), Taguchi et al.
patent: 4543318 (1985-09-01), Maeda et al.

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