Photosensitive resin composition

Details Photosensitive resin composition Photosensitive resin composition

1990-05-15

1990-12-25

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430910, 430919, 430920, 522 25, 522 63, B03C 173

Patent

active

049802666

ABSTRACT:
A photosensitive resin composition comprising (A) a carboxyl group-containing film-forming property imparting polymer, (B) a copolymerizable vinyl compound, (C) a photopolymerization initiator, and (D) a 1,2,3-benzotriazole derivative is useful for forming a photosensitive film excellent in resistance to plating and stability.

REFERENCES:
patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4289843 (1981-09-01), Boutle et al.
patent: 4320189 (1982-03-01), Taguchi et al.
patent: 4543318 (1985-09-01), Maeda et al.

Affiliated with

Also associated with

Rating

Photosensitive resin composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive resin composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1162175