Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-09-20
1997-10-28
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
522103, G03C 1725
Patent
active
056816847
ABSTRACT:
To provide a water-developable photosensitive resin composition capable of forming a resist film that excels in hardness, heat resistance and water resistance.
The photosensitive resin composition of this invention is characterized by containing an unsaturated epoxy ester compound which is obtained by reacting the remaining epoxy side group of a partially carboxylic acid-esterified unsaturated epoxy ester compound with an aliphatic tertiary amine in the presence of an alcoholic solvent to convert it into a quaternary ammonium salt.
REFERENCES:
patent: 5093223 (1992-03-01), Iwasawa et al.
patent: 5468784 (1995-11-01), Yanagawa et al.
patent: 5512607 (1996-04-01), Kinashi et al.
Chiba Reiko
Kinashi Keiichi
Chapman Mark
Looper Valerie E.
National Starch and Chemical Investment Holding Corporation
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