Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2003-11-13
2008-03-25
McClendon, Sanza L. (Department: 1796)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S269000, C430S270100, C430S286100, C430S287100, C430S909000, C522S162000, C522S178000, C522S179000, C522S181000, C522S182000, C522S113000, C522S114000, C522S120000, C522S122000, C522S104000, C522S105000, C528S230000, C528S246000, C528S248000, C528S249000, C528S250000, C528S271000, C528S272000, C528S279000, C528S365000, C528S366000, C525S055000, C525S056000, C525S058000, C525S059000, C525S062000
Reexamination Certificate
active
07348128
ABSTRACT:
A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under hydrous conditions as well as exhibiting high cure-related sensitivity and high flexibility and being uniformly solidified even under highly hydrous conditions, a photosensitive resin composition containing the resin, and a novel compound.The photosensitive resin is a saponified poly(vinyl acetate)-based photosensitive resin having a structural unit represented by formula (1):(wherein R1represents H or Me; R2represents a linear or branched C2-C10 alkylene group; n is an integer of 1 to 3; X representsm is an integer of 0 to 6; and Y represents an aromatic ring or a single bond).
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Supplementary European Search Report for European Application No. EP03772745 (foreign counterpart application) dated Jan. 19, 2007.
Miyazaki Mitsuharu
Takano Masahiro
Utsunomiya Shin
Yamada Seigo
Gomez Brian A.
Gomez International Patent Office, LLC
McClendon Sanza L.
Toyo Gosei Co., Ltd.
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