Photosensitive resin, and photosensitive composition

Details Photosensitive resin, and photosensitive composition Photosensitive resin, and photosensitive composition

2007-11-30

2010-12-28

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S919000, C430S920000, C430S921000, C430S922000, C526S286000, C526S288000, C526S256000, C526S257000

Reexamination Certificate

active

07858287

ABSTRACT:
A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1):(wherein R1represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2to R5represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6and R7represents an organic group, wherein R6and R7may together form a divalent organic group; and X−represents an anion);at least one of a repeating unit represented by formula (2):(wherein R8represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3):a repeating unit represented by formula (4):optionally, a repeating unit represented by formula (5).

REFERENCES:
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patent: 7514204 (2009-04-01), Hatakeyama et al.
patent: 2002/0182541 (2002-12-01), Gonsalves
patent: 2007/0219368 (2007-09-01), Iwabuchi et al.
patent: 2005-084365 (2005-03-01), None
patent: 2008-062114 (2008-03-01), None

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