Photosensitive resin and composition thereof derived from saponi

Details Photosensitive resin and composition thereof derived from saponi Photosensitive resin and composition thereof derived from saponi

1999-08-05

2000-10-31

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430909, 430325, 525 58, 525 59, 525 61, G03C 173, G03C 174, G03F 709, G03F 730, G03F 720

Patent

active

061400181

ABSTRACT:
The invention provides a photosensitive resin and a photosensitive resin composition having excellent water resistance after hardening, excellent developability, and excellent patterning characteristics, and a pattern formation method making use of the composition. The invention provides saponified PVA photosensitive resin which contains structural units represented by formulas (I) and (II): ##STR1## the content of the structural units represented by formulas (I) and (II) in the resin being 0.5-10 mol % with respect to entirety of the structural units of the saponified product of PVA.

REFERENCES:
patent: 4564580 (1986-01-01), Ichimura et al.

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